Scaling behavior of nanoimprint and nanoprinting lithography for producing nanostructures of molybdenum disulfide

Top-down lithography techniques are needed for manufacturing uniform device structures based on emerging 2D-layered materials. Mechanical exfoliation approaches based on nanoimprint and nanoprint principles are capable of producing ordered arrays of multilayer transition metal dichalcogenide microst...

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Detalles Bibliográficos
Autores principales: Chen, Mikai, Rokni, Hossein, Lu, Wei, Liang, Xiaogan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2017
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6444983/
https://www.ncbi.nlm.nih.gov/pubmed/31057879
http://dx.doi.org/10.1038/micronano.2017.53

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6444983/
https://www.ncbi.nlm.nih.gov/pubmed/31057879
http://dx.doi.org/10.1038/micronano.2017.53

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