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Scaling behavior of nanoimprint and nanoprinting lithography for producing nanostructures of molybdenum disulfide
Top-down lithography techniques are needed for manufacturing uniform device structures based on emerging 2D-layered materials. Mechanical exfoliation approaches based on nanoimprint and nanoprint principles are capable of producing ordered arrays of multilayer transition metal dichalcogenide microst...
| Autores principales: | , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Nature Publishing Group
2017
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6444983/ https://www.ncbi.nlm.nih.gov/pubmed/31057879 http://dx.doi.org/10.1038/micronano.2017.53 |