Nanoimprint lithography steppers for volume fabrication of leading-edge semiconductor integrated circuits

This article discusses the transition of a form of nanoimprint lithography technology, known as Jet and Flash Imprint Lithography (J-FIL), from research to a commercial fabrication infrastructure for leading-edge semiconductor integrated circuits (ICs). Leading-edge semiconductor lithography has som...

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Detalles Bibliográficos
Autor principal: Sreenivasan, S.V.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2017
Materias:
Review Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6445000/
https://www.ncbi.nlm.nih.gov/pubmed/31057889
http://dx.doi.org/10.1038/micronano.2017.75

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6445000/
https://www.ncbi.nlm.nih.gov/pubmed/31057889
http://dx.doi.org/10.1038/micronano.2017.75

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