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Nanoimprint lithography steppers for volume fabrication of leading-edge semiconductor integrated circuits
This article discusses the transition of a form of nanoimprint lithography technology, known as Jet and Flash Imprint Lithography (J-FIL), from research to a commercial fabrication infrastructure for leading-edge semiconductor integrated circuits (ICs). Leading-edge semiconductor lithography has som...
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
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Nature Publishing Group
2017
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6445000/ https://www.ncbi.nlm.nih.gov/pubmed/31057889 http://dx.doi.org/10.1038/micronano.2017.75 |