Tantalum Oxynitride Thin Films: Assessment of the Photocatalytic Efficiency and Antimicrobial Capacity

Tantalum oxynitride thin films have been deposited by reactive magnetron sputtering, using a fixed proportion reactive gas mixture (85% N(2) + 15% O(2)). To produce the films, the partial pressure of the mixture in the working atmosphere was varied. The characteristics of the produced films were ana...

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Detalles Bibliográficos
Autores principales: Cristea, Daniel, Cunha, Luis, Gabor, Camelia, Ghiuta, Ioana, Croitoru, Catalin, Marin, Alexandru, Velicu, Laura, Besleaga, Alexandra, Vasile, Bogdan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6474096/
https://www.ncbi.nlm.nih.gov/pubmed/30909538
http://dx.doi.org/10.3390/nano9030476

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6474096/
https://www.ncbi.nlm.nih.gov/pubmed/30909538
http://dx.doi.org/10.3390/nano9030476

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