Cargando…
Performance Improvement of a Nonvolatile UV TD Sensor Using SAHAOS with a High Temperature Annealed, Partially Nano-Crystallized Trapping Layer
This study shows that a silicon–aluminum oxide–hafnium aluminum oxide-silicon oxide–silicon capacitor device with a high temperature pre-metal-anneal-treated and partially-nanocrystallized hafnium aluminum oxide, (hereafter PNC-SAHAOS) can successfully increase the performance of a nonvolatile ultra...
Autor principal: | Hsieh, Wen-Ching |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2019
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6480127/ https://www.ncbi.nlm.nih.gov/pubmed/30939786 http://dx.doi.org/10.3390/s19071570 |
Ejemplares similares
-
High Pressure Deuterium Passivation of Charge Trapping Layer for Nonvolatile Memory Applications
por: Sung, Jae-Young, et al.
Publicado: (2021) -
Microwave Synthesized ZnO Nanorod Arrays for UV Sensors: A Seed Layer Annealing Temperature Study
por: Pimentel, Ana, et al.
Publicado: (2016) -
Solution-processed zirconium acetylacetonate charge-trap layer for multi-bit nonvolatile thin-film memory transistors
por: Lee, Song, et al.
Publicado: (2023) -
Strengthening face centered cubic crystals by annealing induced nano-twins
por: Roy, Barna, et al.
Publicado: (2017) -
Charge Storage and Reliability Characteristics of Nonvolatile Memory Capacitors with HfO(2)/Al(2)O(3)-Based Charge Trapping Layers
por: Spassov, Dencho, et al.
Publicado: (2022)