Research on the Surface Evolution of Single Crystal Silicon Mirror Contaminated by Metallic Elements during Elastic Jet Polishing Techniques

Metallic elements can contaminate single crystal silicon mirror during ion beam etching (IBE) and other postprocessing methods, which can affect the performance of components in an infrared laser system. In this work, scanning electron microscope (SEM) and atomic force microscope (AFM) were used to...

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Detalles Bibliográficos
Autores principales: Zhang, Wanli, Shi, Feng, Dai, Yifan, Zhong, Yaoyu, Song, Ci, Tian, Ye
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6480570/
https://www.ncbi.nlm.nih.gov/pubmed/30986902
http://dx.doi.org/10.3390/ma12071077

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6480570/
https://www.ncbi.nlm.nih.gov/pubmed/30986902
http://dx.doi.org/10.3390/ma12071077

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