Dataset on large area nano-crystalline graphite film (NCG) grown on SiO(2) using plasma-enhanced chemical vapour deposition

A Si wafer coated with a low temperature oxide (LTO) was used as substrate (Si/SiO(2)) during the deposition of a thick nano-crystalline graphite (NCG) film by means of plasma-enhanced chemical vapour deposition (PECVD) procedure. The process parameters, the atomic force (AFM) and scanning electron...

Descripción completa

Detalles Bibliográficos
Autores principales: Albu, Camelia, Eremia, Sandra A.V., Veca, Monica Lucia, Avram, Andrei, Popa, Radu Cristian, Pachiu, Cristina, Romanitan, Cosmin, Kusko, Mihaela, Gavrila, Raluca, Radoi, Antonio
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Elsevier 2019
Materias:
Materials Science
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6484281/
https://www.ncbi.nlm.nih.gov/pubmed/31049377
http://dx.doi.org/10.1016/j.dib.2019.103923

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6484281/
https://www.ncbi.nlm.nih.gov/pubmed/31049377
http://dx.doi.org/10.1016/j.dib.2019.103923

Ejemplares similares