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Dataset on large area nano-crystalline graphite film (NCG) grown on SiO(2) using plasma-enhanced chemical vapour deposition

A Si wafer coated with a low temperature oxide (LTO) was used as substrate (Si/SiO(2)) during the deposition of a thick nano-crystalline graphite (NCG) film by means of plasma-enhanced chemical vapour deposition (PECVD) procedure. The process parameters, the atomic force (AFM) and scanning electron...

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Detalles Bibliográficos
Autores principales:	Albu, Camelia, Eremia, Sandra A.V., Veca, Monica Lucia, Avram, Andrei, Popa, Radu Cristian, Pachiu, Cristina, Romanitan, Cosmin, Kusko, Mihaela, Gavrila, Raluca, Radoi, Antonio
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	Elsevier 2019
Materias:	Materials Science
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6484281/ https://www.ncbi.nlm.nih.gov/pubmed/31049377 http://dx.doi.org/10.1016/j.dib.2019.103923

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