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Atomic-scale diffusion rates during growth of thin metal films on weakly-interacting substrates
We use a combined experimental and theoretical approach to study the rates of surface diffusion processes that govern early stages of thin Ag and Cu film morphological evolution on weakly-interacting amorphous carbon substrates. Films are deposited by magnetron sputtering, at temperatures T(S) betwe...
| Autores principales: | , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Nature Publishing Group UK
2019
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6488595/ https://www.ncbi.nlm.nih.gov/pubmed/31036908 http://dx.doi.org/10.1038/s41598-019-43107-8 |