Cargando…

3D Patterning of Si by Contact Etching With Nanoporous Metals

Nanoporous gold and platinum electrodes are used to pattern n-type silicon by contact etching at the macroscopic scale. This type of electrode has the advantage of forming nanocontacts between silicon, the metal and the electrolyte as in classical metal assisted chemical etching while ensuring elect...

Descripción completa

Detalles Bibliográficos
Autores principales:	Bastide, Stéphane, Torralba, Encarnacion, Halbwax, Mathieu, Le Gall, Sylvain, Mpogui, Elias, Cachet-Vivier, Christine, Magnin, Vincent, Harari, Joseph, Yarekha, Dmitri, Vilcot, Jean-Pierre
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	Frontiers Media S.A. 2019
Materias:	Chemistry
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6494945/ https://www.ncbi.nlm.nih.gov/pubmed/31106193 http://dx.doi.org/10.3389/fchem.2019.00256

Ejemplares similares

Mesopore Formation and Silicon Surface Nanostructuration by Metal-Assisted Chemical Etching With Silver Nanoparticles
por: Pinna, Elisa, et al.
Publicado: (2020)

Monolithic Solder-On Nanoporous Si-Cu Contacts for Stretchable Silicone Composite Sensors
por: Kasimatis, Michael, et al.
Publicado: (2019)

Machine Learning to Improve the Sensing of Biomolecules by Conical Track-Etched Nanopore
por: Meyer, Nathan, et al.
Publicado: (2020)

Fabrication of ordered nanoporous anodic alumina prepatterned by mold-assisted chemical etching
por: Lai, Kuan-Liang, et al.
Publicado: (2011)

Chemical Composition of Nanoporous Layer Formed by Electrochemical Etching of p-Type GaAs
por: Bioud, Youcef A., et al.
Publicado: (2016)

Electroless etching of Si with IO(3)(–) and related species
por: Kolasinski, Kurt W, et al.
Publicado: (2012)

Curved Structure of Si by Improving Etching Direction Controllability in Magnetically Guided Metal-Assisted Chemical Etching
por: Kim, Tae Kyoung, et al.
Publicado: (2020)

Crystallization of gas-selective nanoporous graphene by competitive etching and growth: a modeling study
por: Dutta, Soumajit, et al.
Publicado: (2019)

Fabrication of Submicron Beams with Galvanic Etch Stop for Si in TMAH
por: Lu, Rong, et al.
Publicado: (2009)

Etched p-Type Si Nanowires for Efficient Ozone Decomposition
por: Li, Xuan, et al.
Publicado: (2019)

Novel Method for Electroless Etching of 6H–SiC
por: Károlyházy, Gyula, et al.
Publicado: (2020)

Interfacial Contact is Required for Metal-Assisted Plasma Etching of Silicon
por: Sun, Julia B., et al.
Publicado: (2018)

Layer-by-layer modification effects on a nanopore's inner surface of polycarbonate track-etched membranes
por: Paoli, Roberto, et al.
Publicado: (2020)

Investigation into SiO(2) Etching Characteristics Using Fluorocarbon Capacitively Coupled Plasmas: Etching with Radical/Ion Flux-Controlled
por: Jeong, Won-nyoung, et al.
Publicado: (2022)

Fabrication mechanism of friction-induced selective etching on Si(100) surface
por: Guo, Jian, et al.
Publicado: (2012)

Analysis of p-Si macropore etching using FFT-impedance spectroscopy
por: Ossei-Wusu, Emmanuel, et al.
Publicado: (2012)

Nondestructive nanofabrication on Si(100) surface by tribochemistry-induced selective etching
por: Guo, Jian, et al.
Publicado: (2015)

Effects of Etching Variations on Ge/Si Channel Formation and Device Performance
por: Chen, Jiann-Lin, et al.
Publicado: (2018)

Infinite Selectivity of Wet SiO(2) Etching in Respect to Al
por: Gablech, Imrich, et al.
Publicado: (2020)

Micropipes in SiC Single Crystal Observed by Molten KOH Etching
por: Wang, Hejing, et al.
Publicado: (2021)

Fabrication of Solid State Nanopore in Thin Silicon Membrane Using Low Cost Multistep Chemical Etching
por: Khan, Muhammad Shuja, et al.
Publicado: (2015)

Triangle pore arrays fabricated on Si (111) substrate by sphere lithography combined with metal-assisted chemical etching and anisotropic chemical etching
por: Asoh, Hidetaka, et al.
Publicado: (2012)

Etching gas-sieving nanopores in single-layer graphene with an angstrom precision for high-performance gas mixture separation
por: Zhao, J., et al.
Publicado: (2019)

From Chip Size to Wafer-Scale Nanoporous Gold Reliable Fabrication Using Low Currents Electrochemical Etching
por: Varasteanu, Pericle, et al.
Publicado: (2020)

Selective Etching of Si versus Si(1−x)Ge(x) in Tetramethyl Ammonium Hydroxide Solutions with Surfactant
por: Choi, Yongjoon, et al.
Publicado: (2022)

Fabrication of uniform 4H-SiC mesopores by pulsed electrochemical etching
por: Tan, Jia-Hui, et al.
Publicado: (2014)

Silicon Nanostructures Produced by Modified MacEtch Method for Antireflective Si Surface
por: Nichkalo, Stepan, et al.
Publicado: (2017)

Layer Transfer from Chemically Etched 150 mm Porous Si Substrates
por: Terheiden, Barbara, et al.
Publicado: (2011)

Systematic Characterization of Plasma-Etched Trenches on 4H-SiC Wafers
por: Pirnaci, Massimo D., et al.
Publicado: (2021)

Nanostructuring of Si substrates by a metal-assisted chemical etching and dewetting process
por: Stafiniak, Andrzej, et al.
Publicado: (2018)

Mechanistic Insight into Etching Chemistry and HF-Assisted Etching of MgO-Al(2)O(3)-SiO(2) Glass-Ceramic
por: Ji, Yanxin, et al.
Publicado: (2018)

In Situ Study of the Wet Chemical Etching of SiO(2) and Nanoparticle@SiO(2) Core–Shell Nanospheres
por: Grau-Carbonell, Albert, et al.
Publicado: (2021)

Nanoporous PbSe–SiO(2) Thermoelectric Composites
por: Wu, Chao‐Feng, et al.
Publicado: (2017)

Performance-Enhanced 365 nm UV LEDs with Electrochemically Etched Nanoporous AlGaN Distributed Bragg Reflectors
por: Lu, Xingdong, et al.
Publicado: (2019)

Efficient Fabrication of Nanoporous Si and Si/Ge Enabled by a Heat Scavenger in Magnesiothermic Reactions
por: Luo, Wei, et al.
Publicado: (2013)

Tunable graphene doping by modulating the nanopore geometry on a SiO(2)/Si substrate
por: Lim, Namsoo, et al.
Publicado: (2018)

Evolution of Si Crystallographic Planes-Etching of Square and Circle Patterns in 25 wt % TMAH
por: Smiljanić, Milče M., et al.
Publicado: (2019)

Heterogeneous optoelectronic characteristics of Si micropillar arrays fabricated by metal-assisted chemical etching
por: Qian, Yang, et al.
Publicado: (2020)

Characterization of SiO(2) Etching Profiles in Pulse-Modulated Capacitively Coupled Plasmas
por: Cho, Chulhee, et al.
Publicado: (2021)

OES diagnostics as a universal technique to control the Si etching structures profile in ICP
por: Osipov, Artem A., et al.
Publicado: (2022)

Cannot write session to /tmp/vufind_sessions/sess_519tu23euvp1cg43hm4g82n6ce