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The Effects of Precursor C(2)H(2) Fraction on Microstructure and Properties of Amorphous Carbon Composite Films Containing Si and Ag Prepared by Magnetron Sputtering Deposition
Hydrogenated graphite-like carbon composite films containing silicon (Si) and silver (Ag) (g-C:H:Si:Ag) were prepared by middle frequency magnetron sputtering deposition in argon (Ar) and acetylene (C(2)H(2)) mixture gases. The effects of precursor C(2)H(2) fraction on the microstructure and propert...
Autores principales: | , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2019
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6523700/ https://www.ncbi.nlm.nih.gov/pubmed/30987154 http://dx.doi.org/10.3390/nano9040528 |
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author | Liu, Xiaoqiang Hao, Junying Lv, Yongjun Cui, Xuejun |
author_facet | Liu, Xiaoqiang Hao, Junying Lv, Yongjun Cui, Xuejun |
author_sort | Liu, Xiaoqiang |
collection | PubMed |
description | Hydrogenated graphite-like carbon composite films containing silicon (Si) and silver (Ag) (g-C:H:Si:Ag) were prepared by middle frequency magnetron sputtering deposition in argon (Ar) and acetylene (C(2)H(2)) mixture gases. The effects of precursor C(2)H(2) fraction on the microstructure and properties were studied. The results of Raman and X-ray photoelectron spectroscope (XPS) revealed that the films were dominated by sp(2) carbon sites. It was observed from transmission electron microscope (TEM) that the films contained nanoparticles mainly consisting of Ag, and their size increased with the decrease in the C(2)H(2) fraction. Si was also found to aggregate in the areas where Ag nanoparticles formed in films with high Si content. The comparative studies on the frictional behaviors of films sliding against aluminum oxide were carried out in ambient air and saline solution. The g-C:H:Si:Ag films still exhibited outstanding frictional properties even when the test environment shifts from ambient air to saline solution. |
format | Online Article Text |
id | pubmed-6523700 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2019 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-65237002019-06-03 The Effects of Precursor C(2)H(2) Fraction on Microstructure and Properties of Amorphous Carbon Composite Films Containing Si and Ag Prepared by Magnetron Sputtering Deposition Liu, Xiaoqiang Hao, Junying Lv, Yongjun Cui, Xuejun Nanomaterials (Basel) Article Hydrogenated graphite-like carbon composite films containing silicon (Si) and silver (Ag) (g-C:H:Si:Ag) were prepared by middle frequency magnetron sputtering deposition in argon (Ar) and acetylene (C(2)H(2)) mixture gases. The effects of precursor C(2)H(2) fraction on the microstructure and properties were studied. The results of Raman and X-ray photoelectron spectroscope (XPS) revealed that the films were dominated by sp(2) carbon sites. It was observed from transmission electron microscope (TEM) that the films contained nanoparticles mainly consisting of Ag, and their size increased with the decrease in the C(2)H(2) fraction. Si was also found to aggregate in the areas where Ag nanoparticles formed in films with high Si content. The comparative studies on the frictional behaviors of films sliding against aluminum oxide were carried out in ambient air and saline solution. The g-C:H:Si:Ag films still exhibited outstanding frictional properties even when the test environment shifts from ambient air to saline solution. MDPI 2019-04-03 /pmc/articles/PMC6523700/ /pubmed/30987154 http://dx.doi.org/10.3390/nano9040528 Text en © 2019 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Liu, Xiaoqiang Hao, Junying Lv, Yongjun Cui, Xuejun The Effects of Precursor C(2)H(2) Fraction on Microstructure and Properties of Amorphous Carbon Composite Films Containing Si and Ag Prepared by Magnetron Sputtering Deposition |
title | The Effects of Precursor C(2)H(2) Fraction on Microstructure and Properties of Amorphous Carbon Composite Films Containing Si and Ag Prepared by Magnetron Sputtering Deposition |
title_full | The Effects of Precursor C(2)H(2) Fraction on Microstructure and Properties of Amorphous Carbon Composite Films Containing Si and Ag Prepared by Magnetron Sputtering Deposition |
title_fullStr | The Effects of Precursor C(2)H(2) Fraction on Microstructure and Properties of Amorphous Carbon Composite Films Containing Si and Ag Prepared by Magnetron Sputtering Deposition |
title_full_unstemmed | The Effects of Precursor C(2)H(2) Fraction on Microstructure and Properties of Amorphous Carbon Composite Films Containing Si and Ag Prepared by Magnetron Sputtering Deposition |
title_short | The Effects of Precursor C(2)H(2) Fraction on Microstructure and Properties of Amorphous Carbon Composite Films Containing Si and Ag Prepared by Magnetron Sputtering Deposition |
title_sort | effects of precursor c(2)h(2) fraction on microstructure and properties of amorphous carbon composite films containing si and ag prepared by magnetron sputtering deposition |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6523700/ https://www.ncbi.nlm.nih.gov/pubmed/30987154 http://dx.doi.org/10.3390/nano9040528 |
work_keys_str_mv | AT liuxiaoqiang theeffectsofprecursorc2h2fractiononmicrostructureandpropertiesofamorphouscarboncompositefilmscontainingsiandagpreparedbymagnetronsputteringdeposition AT haojunying theeffectsofprecursorc2h2fractiononmicrostructureandpropertiesofamorphouscarboncompositefilmscontainingsiandagpreparedbymagnetronsputteringdeposition AT lvyongjun theeffectsofprecursorc2h2fractiononmicrostructureandpropertiesofamorphouscarboncompositefilmscontainingsiandagpreparedbymagnetronsputteringdeposition AT cuixuejun theeffectsofprecursorc2h2fractiononmicrostructureandpropertiesofamorphouscarboncompositefilmscontainingsiandagpreparedbymagnetronsputteringdeposition AT liuxiaoqiang effectsofprecursorc2h2fractiononmicrostructureandpropertiesofamorphouscarboncompositefilmscontainingsiandagpreparedbymagnetronsputteringdeposition AT haojunying effectsofprecursorc2h2fractiononmicrostructureandpropertiesofamorphouscarboncompositefilmscontainingsiandagpreparedbymagnetronsputteringdeposition AT lvyongjun effectsofprecursorc2h2fractiononmicrostructureandpropertiesofamorphouscarboncompositefilmscontainingsiandagpreparedbymagnetronsputteringdeposition AT cuixuejun effectsofprecursorc2h2fractiononmicrostructureandpropertiesofamorphouscarboncompositefilmscontainingsiandagpreparedbymagnetronsputteringdeposition |