Surface deep profile synchrotron studies of mechanically modified top-down silicon nanowires array using ultrasoft X-ray absorption near edge structure spectroscopy

Atomic, electronic structure and composition of top-down metal-assisted wet-chemically etched silicon nanowires were studied by synchrotron radiation based X-ray absorption near edge structure technique. Local surrounding of the silicon and oxygen atoms in silicon nanowires array was studied on as-p...

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Detalles Bibliográficos
Autores principales: Turishchev, S. Yu., Parinova, E. V., Pisliaruk, A. K., Koyuda, D. A., Yermukhamed, D., Ming, T., Ovsyannikov, R., Smirnov, D., Makarova, A., Sivakov, V.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6542791/
https://www.ncbi.nlm.nih.gov/pubmed/31147575
http://dx.doi.org/10.1038/s41598-019-44555-y

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6542791/
https://www.ncbi.nlm.nih.gov/pubmed/31147575
http://dx.doi.org/10.1038/s41598-019-44555-y

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