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High Mobility Ge pMOSFETs with ZrO(2) Dielectric: Impacts of Post Annealing
This paper investigates the impacts of post metal annealing (PMA) and post deposition annealing (PDA) on the electrical performance of Ge p-type metal-oxide-semiconductor field-effect transistors (pMOSFETs) with ZrO(2) dielectric. For the transistors without PDA, on-state current (I(ON)), subthresho...
Autores principales: | , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Springer US
2019
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6560113/ https://www.ncbi.nlm.nih.gov/pubmed/31187310 http://dx.doi.org/10.1186/s11671-019-3037-4 |
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author | Liu, Huan Han, Genquan Liu, Yan Hao, Yue |
author_facet | Liu, Huan Han, Genquan Liu, Yan Hao, Yue |
author_sort | Liu, Huan |
collection | PubMed |
description | This paper investigates the impacts of post metal annealing (PMA) and post deposition annealing (PDA) on the electrical performance of Ge p-type metal-oxide-semiconductor field-effect transistors (pMOSFETs) with ZrO(2) dielectric. For the transistors without PDA, on-state current (I(ON)), subthreshold swing (SS), and capacitance equivalent thickness (CET) characteristics are improved with PMA temperature increasing from 350 to 500 °C. Crystallization of ZrO(2) dielectric at the higher PMA temperature contributes to the increase of the permittivity of ZrO(2) and the decrease of the density of interface states (D(it)), resulting in a reduced CET and high effective hole mobility (μ(eff)). It is demonstrated that Ge pMOSFETs with a PDA treatment at 400 °C have a lower CET and a steeper SS but a lower μ(eff) compared to devices without PDA. |
format | Online Article Text |
id | pubmed-6560113 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2019 |
publisher | Springer US |
record_format | MEDLINE/PubMed |
spelling | pubmed-65601132019-06-28 High Mobility Ge pMOSFETs with ZrO(2) Dielectric: Impacts of Post Annealing Liu, Huan Han, Genquan Liu, Yan Hao, Yue Nanoscale Res Lett Nano Express This paper investigates the impacts of post metal annealing (PMA) and post deposition annealing (PDA) on the electrical performance of Ge p-type metal-oxide-semiconductor field-effect transistors (pMOSFETs) with ZrO(2) dielectric. For the transistors without PDA, on-state current (I(ON)), subthreshold swing (SS), and capacitance equivalent thickness (CET) characteristics are improved with PMA temperature increasing from 350 to 500 °C. Crystallization of ZrO(2) dielectric at the higher PMA temperature contributes to the increase of the permittivity of ZrO(2) and the decrease of the density of interface states (D(it)), resulting in a reduced CET and high effective hole mobility (μ(eff)). It is demonstrated that Ge pMOSFETs with a PDA treatment at 400 °C have a lower CET and a steeper SS but a lower μ(eff) compared to devices without PDA. Springer US 2019-06-11 /pmc/articles/PMC6560113/ /pubmed/31187310 http://dx.doi.org/10.1186/s11671-019-3037-4 Text en © The Author(s). 2019 Open AccessThis article is distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution, and reproduction in any medium, provided you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. |
spellingShingle | Nano Express Liu, Huan Han, Genquan Liu, Yan Hao, Yue High Mobility Ge pMOSFETs with ZrO(2) Dielectric: Impacts of Post Annealing |
title | High Mobility Ge pMOSFETs with ZrO(2) Dielectric: Impacts of Post Annealing |
title_full | High Mobility Ge pMOSFETs with ZrO(2) Dielectric: Impacts of Post Annealing |
title_fullStr | High Mobility Ge pMOSFETs with ZrO(2) Dielectric: Impacts of Post Annealing |
title_full_unstemmed | High Mobility Ge pMOSFETs with ZrO(2) Dielectric: Impacts of Post Annealing |
title_short | High Mobility Ge pMOSFETs with ZrO(2) Dielectric: Impacts of Post Annealing |
title_sort | high mobility ge pmosfets with zro(2) dielectric: impacts of post annealing |
topic | Nano Express |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6560113/ https://www.ncbi.nlm.nih.gov/pubmed/31187310 http://dx.doi.org/10.1186/s11671-019-3037-4 |
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