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Graphene Schottky Junction on Pillar Patterned Silicon Substrate

A graphene/silicon junction with rectifying behaviour and remarkable photo-response was fabricated by transferring a graphene monolayer on a pillar-patterned Si substrate. The device forms a 0.11 eV Schottky barrier with 2.6 ideality factor at room temperature and exhibits strongly bias- and tempera...

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Autores principales: Luongo, Giuseppe, Grillo, Alessandro, Giubileo, Filippo, Iemmo, Laura, Lukosius, Mindaugas, Alvarado Chavarin, Carlos, Wenger, Christian, Di Bartolomeo, Antonio
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6566384/
https://www.ncbi.nlm.nih.gov/pubmed/31027368
http://dx.doi.org/10.3390/nano9050659
_version_ 1783426840130486272
author Luongo, Giuseppe
Grillo, Alessandro
Giubileo, Filippo
Iemmo, Laura
Lukosius, Mindaugas
Alvarado Chavarin, Carlos
Wenger, Christian
Di Bartolomeo, Antonio
author_facet Luongo, Giuseppe
Grillo, Alessandro
Giubileo, Filippo
Iemmo, Laura
Lukosius, Mindaugas
Alvarado Chavarin, Carlos
Wenger, Christian
Di Bartolomeo, Antonio
author_sort Luongo, Giuseppe
collection PubMed
description A graphene/silicon junction with rectifying behaviour and remarkable photo-response was fabricated by transferring a graphene monolayer on a pillar-patterned Si substrate. The device forms a 0.11 eV Schottky barrier with 2.6 ideality factor at room temperature and exhibits strongly bias- and temperature-dependent reverse current. Below room temperature, the reverse current grows exponentially with the applied voltage because the pillar-enhanced electric field lowers the Schottky barrier. Conversely, at higher temperatures, the charge carrier thermal generation is dominant and the reverse current becomes weakly bias-dependent. A quasi-saturated reverse current is similarly observed at room temperature when the charge carriers are photogenerated under light exposure. The device shows photovoltaic effect with 0.7% power conversion efficiency and achieves 88 A/W photoresponsivity when used as photodetector.
format Online
Article
Text
id pubmed-6566384
institution National Center for Biotechnology Information
language English
publishDate 2019
publisher MDPI
record_format MEDLINE/PubMed
spelling pubmed-65663842019-06-17 Graphene Schottky Junction on Pillar Patterned Silicon Substrate Luongo, Giuseppe Grillo, Alessandro Giubileo, Filippo Iemmo, Laura Lukosius, Mindaugas Alvarado Chavarin, Carlos Wenger, Christian Di Bartolomeo, Antonio Nanomaterials (Basel) Article A graphene/silicon junction with rectifying behaviour and remarkable photo-response was fabricated by transferring a graphene monolayer on a pillar-patterned Si substrate. The device forms a 0.11 eV Schottky barrier with 2.6 ideality factor at room temperature and exhibits strongly bias- and temperature-dependent reverse current. Below room temperature, the reverse current grows exponentially with the applied voltage because the pillar-enhanced electric field lowers the Schottky barrier. Conversely, at higher temperatures, the charge carrier thermal generation is dominant and the reverse current becomes weakly bias-dependent. A quasi-saturated reverse current is similarly observed at room temperature when the charge carriers are photogenerated under light exposure. The device shows photovoltaic effect with 0.7% power conversion efficiency and achieves 88 A/W photoresponsivity when used as photodetector. MDPI 2019-04-26 /pmc/articles/PMC6566384/ /pubmed/31027368 http://dx.doi.org/10.3390/nano9050659 Text en © 2019 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Luongo, Giuseppe
Grillo, Alessandro
Giubileo, Filippo
Iemmo, Laura
Lukosius, Mindaugas
Alvarado Chavarin, Carlos
Wenger, Christian
Di Bartolomeo, Antonio
Graphene Schottky Junction on Pillar Patterned Silicon Substrate
title Graphene Schottky Junction on Pillar Patterned Silicon Substrate
title_full Graphene Schottky Junction on Pillar Patterned Silicon Substrate
title_fullStr Graphene Schottky Junction on Pillar Patterned Silicon Substrate
title_full_unstemmed Graphene Schottky Junction on Pillar Patterned Silicon Substrate
title_short Graphene Schottky Junction on Pillar Patterned Silicon Substrate
title_sort graphene schottky junction on pillar patterned silicon substrate
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6566384/
https://www.ncbi.nlm.nih.gov/pubmed/31027368
http://dx.doi.org/10.3390/nano9050659
work_keys_str_mv AT luongogiuseppe grapheneschottkyjunctiononpillarpatternedsiliconsubstrate
AT grilloalessandro grapheneschottkyjunctiononpillarpatternedsiliconsubstrate
AT giubileofilippo grapheneschottkyjunctiononpillarpatternedsiliconsubstrate
AT iemmolaura grapheneschottkyjunctiononpillarpatternedsiliconsubstrate
AT lukosiusmindaugas grapheneschottkyjunctiononpillarpatternedsiliconsubstrate
AT alvaradochavarincarlos grapheneschottkyjunctiononpillarpatternedsiliconsubstrate
AT wengerchristian grapheneschottkyjunctiononpillarpatternedsiliconsubstrate
AT dibartolomeoantonio grapheneschottkyjunctiononpillarpatternedsiliconsubstrate