Shear-solvo defect annihilation of diblock copolymer thin films over a large area

Achieving defect-free block copolymer (BCP) nanopatterns with a long-ranged orientation over a large area remains a persistent challenge, impeding the successful and widespread application of BCP self-assembly. Here, we demonstrate a new experimental strategy for defect annihilation while conserving...

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Detalles Bibliográficos
Autores principales: Kim, Ye Chan, Shin, Tae Joo, Hur, Su-Mi, Kwon, Seok Joon, Kim, So Youn
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Association for the Advancement of Science 2019
Materias:
Research Articles
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6570509/
https://www.ncbi.nlm.nih.gov/pubmed/31214653
http://dx.doi.org/10.1126/sciadv.aaw3974

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6570509/
https://www.ncbi.nlm.nih.gov/pubmed/31214653
http://dx.doi.org/10.1126/sciadv.aaw3974

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