Thermophysical characterisation of VO(2) thin films hysteresis and its application in thermal rectification

Hysteresis loops exhibited by the thermophysical properties of VO(2) thin films deposited on either a sapphire or silicon substrate have been experimentally measured using a high frequency photothermal radiometry technique. This is achieved by directly measuring the thermal diffusivity and thermal e...

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Detalles Bibliográficos
Autores principales: Hamaoui, Georges, Horny, Nicolas, Gomez-Heredia, Cindy Lorena, Ramirez-Rincon, Jorge Andres, Ordonez-Miranda, Jose, Champeaux, Corinne, Dumas-Bouchiat, Frederic, Alvarado-Gil, Juan Jose, Ezzahri, Younes, Joulain, Karl, Chirtoc, Mihai
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6584564/
https://www.ncbi.nlm.nih.gov/pubmed/31217509
http://dx.doi.org/10.1038/s41598-019-45436-0

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6584564/
https://www.ncbi.nlm.nih.gov/pubmed/31217509
http://dx.doi.org/10.1038/s41598-019-45436-0

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