Enhancing silicide formation in Ni/Si(111) by Ag-Si particles at the interface

Compound formation at a metal/semiconductor interface plays crucial roles in the properties of many material systems. Applications of Ni silicides span numerous areas and have the potential to be used as new functionalities. However, the magnetic properties of ultrathin Ni layers on silicon surfaces...

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Detalles Bibliográficos
Autores principales: Chang, Cheng-Hsun-Tony, Jiang, Pei-Cheng, Chow, Yu-Ting, Hsiao, Hsi-Lien, Su, Wei-Bin, Tsay, Jyh-Shen
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6586651/
https://www.ncbi.nlm.nih.gov/pubmed/31222031
http://dx.doi.org/10.1038/s41598-019-45104-3

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6586651/
https://www.ncbi.nlm.nih.gov/pubmed/31222031
http://dx.doi.org/10.1038/s41598-019-45104-3

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