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A New Analytic Formula for Minority Carrier Decay Length Extraction from Scanning Photocurrent Profiles in Ohmic-Contact Nanowire Devices

Spatially resolved current measurements such as scanning photocurrent microscopy (SPCM) have been extensively applied to investigate carrier transport properties in semiconductor nanowires. A traditional simple-exponential-decay formula based on the assumption of carrier diffusion dominance in the s...

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Detalles Bibliográficos
Autores principales: Chu, Cheng-Hao, Mao, Ming-Hua, Yang, Che-Wei, Lin, Hao-Hsiung
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2019
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6603194/
https://www.ncbi.nlm.nih.gov/pubmed/31263209
http://dx.doi.org/10.1038/s41598-019-46020-2
Descripción
Sumario:Spatially resolved current measurements such as scanning photocurrent microscopy (SPCM) have been extensively applied to investigate carrier transport properties in semiconductor nanowires. A traditional simple-exponential-decay formula based on the assumption of carrier diffusion dominance in the scanning photocurrent profiles can be applied for carrier diffusion length extraction using SPCM in Schottky-contact-based or p-n junction-based devices where large built-in electric fields exist. However, it is also important to study the electric-field dependent transport properties in widely used ohmic-contact nanowire devices where the assumption of carrier diffusion dominance is invalid. Here we derive an analytic formula for scanning photocurrent profiles in such ohmic-contact nanowire devices under uniform applied electric fields and weak optical excitation. Under these operation conditions and the influence of photo-carrier-induced electric field, the scanning photocurrent profile and the carrier spatial distribution strikingly do not share the same functional form. Instead, a surprising new analytic relation between the scanning photocurrent profile and the minority carrier decay length was established. Then the derived analytic formula was validated numerically and experimentally. This analytic formula provides a new fitting method for SPCM profiles to correctly determine the minority carrier decay length, which allows us to quantitatively evaluate the performance of nanowire-based devices.