Universal perpendicular orientation of block copolymer microdomains using a filtered plasma

Sub-10 nm patterns prepared by directed self-assembly (DSA) of block copolymer (BCP) thin films offer a breakthrough method to overcome the limitations of photolithography. Perpendicular orientation of the BCP nanostructures is essential for lithographic applications, but dissimilar surface/interfac...

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Detalles Bibliográficos
Autores principales: Oh, Jinwoo, Suh, Hyo Seon, Ko, Youngpyo, Nah, Yoonseo, Lee, Jong-Chan, Yeom, Bongjun, Char, Kookheon, Ross, Caroline A., Son, Jeong Gon
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6606568/
https://www.ncbi.nlm.nih.gov/pubmed/31266942
http://dx.doi.org/10.1038/s41467-019-10907-5

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6606568/
https://www.ncbi.nlm.nih.gov/pubmed/31266942
http://dx.doi.org/10.1038/s41467-019-10907-5

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