Nanoscale modification of silicon and germanium surfaces exposed to low-energy helium plasma

Complex surface nanostructures were observed in germanium and silicon samples exposed to low energy (24 or 36 eV ion kinetic energy) helium plasma. Pyramidal growth is observed in germanium across the temperature range studied (185 °C to 336 °C), while significant modification in silicon was only ob...

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Detalles Bibliográficos
Autores principales: Thompson, Matt, Magyar, Luke, Corr, Cormac
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6626129/
https://www.ncbi.nlm.nih.gov/pubmed/31300694
http://dx.doi.org/10.1038/s41598-019-46541-w
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author Thompson, Matt
Magyar, Luke
Corr, Cormac
author_facet Thompson, Matt
Magyar, Luke
Corr, Cormac
author_sort Thompson, Matt
collection PubMed
description Complex surface nanostructures were observed in germanium and silicon samples exposed to low energy (24 or 36 eV ion kinetic energy) helium plasma. Pyramidal growth is observed in germanium across the temperature range studied (185 °C to 336 °C), while significant modification in silicon was only observed at 630 °C. Nano-wire growth was observed in both germanium and silicon, and appears to be linked to the strength of the electric field, which in turn determines the implantation energy of the helium ions. Nanostructure formation is proposed to be driven by surface adatom migration which is strongly influenced by an Ehrlich-Schwoebel-type surface instability. The role of helium in this model is to drive germanium interstitial formation by ejecting germanium atoms from lattice sites, leading to germanium interstitial diffusion towards the sample surface and subsequent adatom and surface nanostructure formation.
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spelling pubmed-66261292019-07-21 Nanoscale modification of silicon and germanium surfaces exposed to low-energy helium plasma Thompson, Matt Magyar, Luke Corr, Cormac Sci Rep Article Complex surface nanostructures were observed in germanium and silicon samples exposed to low energy (24 or 36 eV ion kinetic energy) helium plasma. Pyramidal growth is observed in germanium across the temperature range studied (185 °C to 336 °C), while significant modification in silicon was only observed at 630 °C. Nano-wire growth was observed in both germanium and silicon, and appears to be linked to the strength of the electric field, which in turn determines the implantation energy of the helium ions. Nanostructure formation is proposed to be driven by surface adatom migration which is strongly influenced by an Ehrlich-Schwoebel-type surface instability. The role of helium in this model is to drive germanium interstitial formation by ejecting germanium atoms from lattice sites, leading to germanium interstitial diffusion towards the sample surface and subsequent adatom and surface nanostructure formation. Nature Publishing Group UK 2019-07-12 /pmc/articles/PMC6626129/ /pubmed/31300694 http://dx.doi.org/10.1038/s41598-019-46541-w Text en © The Author(s) 2019 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.
spellingShingle Article
Thompson, Matt
Magyar, Luke
Corr, Cormac
Nanoscale modification of silicon and germanium surfaces exposed to low-energy helium plasma
title Nanoscale modification of silicon and germanium surfaces exposed to low-energy helium plasma
title_full Nanoscale modification of silicon and germanium surfaces exposed to low-energy helium plasma
title_fullStr Nanoscale modification of silicon and germanium surfaces exposed to low-energy helium plasma
title_full_unstemmed Nanoscale modification of silicon and germanium surfaces exposed to low-energy helium plasma
title_short Nanoscale modification of silicon and germanium surfaces exposed to low-energy helium plasma
title_sort nanoscale modification of silicon and germanium surfaces exposed to low-energy helium plasma
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6626129/
https://www.ncbi.nlm.nih.gov/pubmed/31300694
http://dx.doi.org/10.1038/s41598-019-46541-w
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AT corrcormac nanoscalemodificationofsiliconandgermaniumsurfacesexposedtolowenergyheliumplasma

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