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Nanoscale modification of silicon and germanium surfaces exposed to low-energy helium plasma

Complex surface nanostructures were observed in germanium and silicon samples exposed to low energy (24 or 36 eV ion kinetic energy) helium plasma. Pyramidal growth is observed in germanium across the temperature range studied (185 °C to 336 °C), while significant modification in silicon was only ob...

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Detalles Bibliográficos
Autores principales: Thompson, Matt, Magyar, Luke, Corr, Cormac
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2019
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6626129/
https://www.ncbi.nlm.nih.gov/pubmed/31300694
http://dx.doi.org/10.1038/s41598-019-46541-w

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