Effect of Sputtering Temperature on Fluorocarbon Films: Surface Nanostructure and Fluorine/Carbon Ratio

In this work, fluorocarbon film was deposited on silicon (P/100) substrate using polytetrafluoroethylene (PTFE) as target material at elevated sputtering temperature. Field emission scanning electron microscopy (FESEM), atomic force microscopy (AFM), Raman spectroscopy and X-ray photoelectron spectr...

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Detalles Bibliográficos
Autores principales: Zhao, Qi, Wang, Feipeng, Wang, Kaizheng, Xie, Guibai, Cui, Wanzhao, Li, Jian
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6631040/
https://www.ncbi.nlm.nih.gov/pubmed/31163587
http://dx.doi.org/10.3390/nano9060848

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6631040/
https://www.ncbi.nlm.nih.gov/pubmed/31163587
http://dx.doi.org/10.3390/nano9060848

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