Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition

[Image: see text] In this study, a plasma-modified process was developed to control the electrical properties of atomic layer deposition (ALD)-grown vanadium dioxide (VO(2)), which is potentially useful for applications such as resistive switching devices, bolometers, and plasmonic metamaterials. By...

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Detalles Bibliográficos
Autores principales: Park, Helen Hejin, Larrabee, Thomas J., Ruppalt, Laura B., Culbertson, James C., Prokes, S. M.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2017
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6640919/
https://www.ncbi.nlm.nih.gov/pubmed/31457501
http://dx.doi.org/10.1021/acsomega.7b00059

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6640919/
https://www.ncbi.nlm.nih.gov/pubmed/31457501
http://dx.doi.org/10.1021/acsomega.7b00059

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