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Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
[Image: see text] In this study, a plasma-modified process was developed to control the electrical properties of atomic layer deposition (ALD)-grown vanadium dioxide (VO(2)), which is potentially useful for applications such as resistive switching devices, bolometers, and plasmonic metamaterials. By...
| Autores principales: | , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
American Chemical Society
2017
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6640919/ https://www.ncbi.nlm.nih.gov/pubmed/31457501 http://dx.doi.org/10.1021/acsomega.7b00059 |