Nonlinear Etch Rate of Au-Assisted Chemical Etching of Silicon

[Image: see text] We demonstrated time-dependent mass transport mechanisms of Au-assisted chemical etching of Si substrates. Variations in the etch rate and surface topology were correlated with catalyst features and etching duration. Nonlinear etching characteristics were associated with the format...

Descripción completa

Detalles Bibliográficos
Autores principales: Choi, Keorock, Song, Yunwon, Ki, Bugeun, Oh, Jungwoo
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2017
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6641051/
https://www.ncbi.nlm.nih.gov/pubmed/31457564
http://dx.doi.org/10.1021/acsomega.7b00232

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6641051/
https://www.ncbi.nlm.nih.gov/pubmed/31457564
http://dx.doi.org/10.1021/acsomega.7b00232

Ejemplares similares