Cargando…
Nonlinear Etch Rate of Au-Assisted Chemical Etching of Silicon
[Image: see text] We demonstrated time-dependent mass transport mechanisms of Au-assisted chemical etching of Si substrates. Variations in the etch rate and surface topology were correlated with catalyst features and etching duration. Nonlinear etching characteristics were associated with the format...
| Autores principales: | , , , |
|---|---|
| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
American Chemical Society
2017
|
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6641051/ https://www.ncbi.nlm.nih.gov/pubmed/31457564 http://dx.doi.org/10.1021/acsomega.7b00232 |