Chemically Stable Atomic-Layer-Deposited Al(2)O(3) Films for Processability

[Image: see text] Atomic-layer-deposited alumina (ALD Al(2)O(3)) can be utilized for passivation, structural, and functional purposes in electronics. In all cases, the deposited film is usually expected to maintain chemical stability over the lifetime of the device or during processing. However, as-...

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Detalles Bibliográficos
Autores principales: Broas, Mikael, Kanninen, Olli, Vuorinen, Vesa, Tilli, Markku, Paulasto-Kröckel, Mervi
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2017
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6641164/
https://www.ncbi.nlm.nih.gov/pubmed/31457661
http://dx.doi.org/10.1021/acsomega.7b00443

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6641164/
https://www.ncbi.nlm.nih.gov/pubmed/31457661
http://dx.doi.org/10.1021/acsomega.7b00443

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