Atomic Layer Deposition of Al–W–Fluoride on LiCoO(2) Cathodes: Comparison of Particle- and Electrode-Level Coatings

[Image: see text] Atomic layer deposition (ALD) of the well-known Al(2)O(3) on a LiCoO(2) system is compared with that of a newly developed AlW(x)F(y) material. ALD coatings (∼1 nm thick) of both materials are shown to be effective in improving cycle life through mitigation of surface-induced capaci...

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Detalles Bibliográficos
Autores principales: Park, Joong Sun, Mane, Anil U., Elam, Jeffrey W., Croy, Jason R.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2017
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6641266/
https://www.ncbi.nlm.nih.gov/pubmed/31457686
http://dx.doi.org/10.1021/acsomega.7b00605

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6641266/
https://www.ncbi.nlm.nih.gov/pubmed/31457686
http://dx.doi.org/10.1021/acsomega.7b00605

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