Self-Assembled Nanofeatures in Complex Three-Dimensional Topographies via Nanoimprint and Block Copolymer Lithography Methods

[Image: see text] Achieving ultrasmall dimensions of materials and retaining high throughput are critical fabrication considerations for nanotechnology use. This article demonstrates an integrated approach for developing isolated sub-20 nm silicon oxide features through combined “top-down” and “bott...

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Detalles Bibliográficos
Autores principales: Cummins, Cian, Borah, Dipu, Rasappa, Sozaraj, Senthamaraikannan, Ramsankar, Simao, Claudia, Francone, Achille, Kehagias, Nikolaos, Sotomayor-Torres, Clivia M., Morris, Michael A.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2017
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6641768/
https://www.ncbi.nlm.nih.gov/pubmed/31457733
http://dx.doi.org/10.1021/acsomega.7b00781

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6641768/
https://www.ncbi.nlm.nih.gov/pubmed/31457733
http://dx.doi.org/10.1021/acsomega.7b00781

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