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Self-Assembled Nanofeatures in Complex Three-Dimensional Topographies via Nanoimprint and Block Copolymer Lithography Methods

[Image: see text] Achieving ultrasmall dimensions of materials and retaining high throughput are critical fabrication considerations for nanotechnology use. This article demonstrates an integrated approach for developing isolated sub-20 nm silicon oxide features through combined “top-down” and “bott...

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Autores principales: Cummins, Cian, Borah, Dipu, Rasappa, Sozaraj, Senthamaraikannan, Ramsankar, Simao, Claudia, Francone, Achille, Kehagias, Nikolaos, Sotomayor-Torres, Clivia M., Morris, Michael A.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2017
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6641768/
https://www.ncbi.nlm.nih.gov/pubmed/31457733
http://dx.doi.org/10.1021/acsomega.7b00781
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author Cummins, Cian
Borah, Dipu
Rasappa, Sozaraj
Senthamaraikannan, Ramsankar
Simao, Claudia
Francone, Achille
Kehagias, Nikolaos
Sotomayor-Torres, Clivia M.
Morris, Michael A.
author_facet Cummins, Cian
Borah, Dipu
Rasappa, Sozaraj
Senthamaraikannan, Ramsankar
Simao, Claudia
Francone, Achille
Kehagias, Nikolaos
Sotomayor-Torres, Clivia M.
Morris, Michael A.
author_sort Cummins, Cian
collection PubMed
description [Image: see text] Achieving ultrasmall dimensions of materials and retaining high throughput are critical fabrication considerations for nanotechnology use. This article demonstrates an integrated approach for developing isolated sub-20 nm silicon oxide features through combined “top-down” and “bottom-up” methods: nanoimprint lithography (NIL) and block copolymer (BCP) lithography. Although techniques like those demonstrated here have been developed for nanolithographic application in the microelectronics processing industry, similar approaches could be utilized for sensor, fluidic, and optical-based devices. Thus, this article centers on looking at the possibility of generating isolated silica structures on substrates. NIL was used to create intriguing three-dimensional (3-D) polyhedral oligomeric silsesquioxane (POSS) topographical arrays that guided and confined polystyrene-block-poly(dimethylsiloxane) (PS-b-PDMS) BCP nanofeatures in isolated regions. A cylinder forming PS-b-PDMS BCP system was successfully etched using a one-step etching process to create line-space arrays with a period of 35 nm in confined POSS arrays. We highlight large-area (>6 μm) coverage of line-space arrays in 3-D topographies that could potentially be utilized, for example, in nanofluidic systems. Aligned features for directed self-assembly application are also demonstrated. The high-density, confined silicon oxide nanofeatures in soft lithographic templates over macroscopic areas illustrate the advantages of integrating distinct lithographic methods for attaining discrete features in the deep nanoscale regime.
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spelling pubmed-66417682019-08-27 Self-Assembled Nanofeatures in Complex Three-Dimensional Topographies via Nanoimprint and Block Copolymer Lithography Methods Cummins, Cian Borah, Dipu Rasappa, Sozaraj Senthamaraikannan, Ramsankar Simao, Claudia Francone, Achille Kehagias, Nikolaos Sotomayor-Torres, Clivia M. Morris, Michael A. ACS Omega [Image: see text] Achieving ultrasmall dimensions of materials and retaining high throughput are critical fabrication considerations for nanotechnology use. This article demonstrates an integrated approach for developing isolated sub-20 nm silicon oxide features through combined “top-down” and “bottom-up” methods: nanoimprint lithography (NIL) and block copolymer (BCP) lithography. Although techniques like those demonstrated here have been developed for nanolithographic application in the microelectronics processing industry, similar approaches could be utilized for sensor, fluidic, and optical-based devices. Thus, this article centers on looking at the possibility of generating isolated silica structures on substrates. NIL was used to create intriguing three-dimensional (3-D) polyhedral oligomeric silsesquioxane (POSS) topographical arrays that guided and confined polystyrene-block-poly(dimethylsiloxane) (PS-b-PDMS) BCP nanofeatures in isolated regions. A cylinder forming PS-b-PDMS BCP system was successfully etched using a one-step etching process to create line-space arrays with a period of 35 nm in confined POSS arrays. We highlight large-area (>6 μm) coverage of line-space arrays in 3-D topographies that could potentially be utilized, for example, in nanofluidic systems. Aligned features for directed self-assembly application are also demonstrated. The high-density, confined silicon oxide nanofeatures in soft lithographic templates over macroscopic areas illustrate the advantages of integrating distinct lithographic methods for attaining discrete features in the deep nanoscale regime. American Chemical Society 2017-08-10 /pmc/articles/PMC6641768/ /pubmed/31457733 http://dx.doi.org/10.1021/acsomega.7b00781 Text en Copyright © 2017 American Chemical Society This is an open access article published under an ACS AuthorChoice License (http://pubs.acs.org/page/policy/authorchoice_termsofuse.html) , which permits copying and redistribution of the article or any adaptations for non-commercial purposes.
spellingShingle Cummins, Cian
Borah, Dipu
Rasappa, Sozaraj
Senthamaraikannan, Ramsankar
Simao, Claudia
Francone, Achille
Kehagias, Nikolaos
Sotomayor-Torres, Clivia M.
Morris, Michael A.
Self-Assembled Nanofeatures in Complex Three-Dimensional Topographies via Nanoimprint and Block Copolymer Lithography Methods
title Self-Assembled Nanofeatures in Complex Three-Dimensional Topographies via Nanoimprint and Block Copolymer Lithography Methods
title_full Self-Assembled Nanofeatures in Complex Three-Dimensional Topographies via Nanoimprint and Block Copolymer Lithography Methods
title_fullStr Self-Assembled Nanofeatures in Complex Three-Dimensional Topographies via Nanoimprint and Block Copolymer Lithography Methods
title_full_unstemmed Self-Assembled Nanofeatures in Complex Three-Dimensional Topographies via Nanoimprint and Block Copolymer Lithography Methods
title_short Self-Assembled Nanofeatures in Complex Three-Dimensional Topographies via Nanoimprint and Block Copolymer Lithography Methods
title_sort self-assembled nanofeatures in complex three-dimensional topographies via nanoimprint and block copolymer lithography methods
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6641768/
https://www.ncbi.nlm.nih.gov/pubmed/31457733
http://dx.doi.org/10.1021/acsomega.7b00781
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