Inverse Moth Eye Nanostructures with Enhanced Antireflection and Contamination Resistance

[Image: see text] Moth-eye-inspired nanostructures are highly useful for antireflection applications. However, block copolymer micelle lithography, an effective method to prepare moth eye nanopillars, can only be used on a limited choice of substrates. Another drawback of nanopillar substrates is th...

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Detalles Bibliográficos
Autores principales: Diao, Zhaolu, Hirte, Johannes, Chen, Wenwen, Spatz, Joachim P.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2017
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6641947/
https://www.ncbi.nlm.nih.gov/pubmed/31457778
http://dx.doi.org/10.1021/acsomega.7b01001

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6641947/
https://www.ncbi.nlm.nih.gov/pubmed/31457778
http://dx.doi.org/10.1021/acsomega.7b01001

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