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Inverse Moth Eye Nanostructures with Enhanced Antireflection and Contamination Resistance
[Image: see text] Moth-eye-inspired nanostructures are highly useful for antireflection applications. However, block copolymer micelle lithography, an effective method to prepare moth eye nanopillars, can only be used on a limited choice of substrates. Another drawback of nanopillar substrates is th...
| Autores principales: | , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
American Chemical Society
2017
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6641947/ https://www.ncbi.nlm.nih.gov/pubmed/31457778 http://dx.doi.org/10.1021/acsomega.7b01001 |