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Photomask-Free, Direct Selective Electroless Deposition on Glass by Controlling Surface Hydrophilicity

[Image: see text] This paper reports a new approach to realize direct selective electroless deposition (ELD) without the requirement of photolithography. This method involves sequential silane-compound modifications in which the first modification creates a hydrophobic surface on the TiO(2)-coated g...

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Detalles Bibliográficos
Autores principales: Wang, Kuan-Ting, Wang, Wei-Yen, Wei, Tzu-Chien
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2019
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6648132/
https://www.ncbi.nlm.nih.gov/pubmed/31459860
http://dx.doi.org/10.1021/acsomega.9b00259