Tunability of MoO(3) Thin-Film Properties Due to Annealing in Situ Monitored by Hard X-ray Photoemission

[Image: see text] The chemical and electronic structure of MoO(3) thin films is monitored by synchrotron-based hard X-ray photoelectron spectroscopy while annealing from room temperature to 310 °C. Color-coded 2D intensity maps of the Mo 3d and O 1s and valence band maximum (VBM) spectra show the ev...

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Detalles Bibliográficos
Autores principales: Liao, Xiaxia, Jeong, Ah Reum, Wilks, Regan G., Wiesner, Sven, Rusu, Marin, Félix, Roberto, Xiao, Ting, Hartmann, Claudia, Bär, Marcus
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2019
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6648274/
https://www.ncbi.nlm.nih.gov/pubmed/31460196
http://dx.doi.org/10.1021/acsomega.9b01027

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6648274/
https://www.ncbi.nlm.nih.gov/pubmed/31460196
http://dx.doi.org/10.1021/acsomega.9b01027

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