Application of Plasmon-Induced Lithography for Creation of a Residual-Free Pattern and Simple Surface Modifications

[Image: see text] Here, we propose a plasmon-induced redistribution of a thin polymer layer as a unique way for a residual layer-free lithographic approach. In particular, we demonstrate an ultrafast area-selective fabrication method using a low-intensity visible laser irradiation to direct the poly...

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Detalles Bibliográficos
Autores principales: Elashnikov, Roman, Háša, Jaromír, Děkanovský, Lukáš, Otta, Jaroslav, Fitl, Přemysl, Švorčík, Václav, Lyutakov, Oleksiy
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2019
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6648495/
https://www.ncbi.nlm.nih.gov/pubmed/31459713
http://dx.doi.org/10.1021/acsomega.8b03039

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6648495/
https://www.ncbi.nlm.nih.gov/pubmed/31459713
http://dx.doi.org/10.1021/acsomega.8b03039

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