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Application of Plasmon-Induced Lithography for Creation of a Residual-Free Pattern and Simple Surface Modifications

[Image: see text] Here, we propose a plasmon-induced redistribution of a thin polymer layer as a unique way for a residual layer-free lithographic approach. In particular, we demonstrate an ultrafast area-selective fabrication method using a low-intensity visible laser irradiation to direct the poly...

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Autores principales: Elashnikov, Roman, Háša, Jaromír, Děkanovský, Lukáš, Otta, Jaroslav, Fitl, Přemysl, Švorčík, Václav, Lyutakov, Oleksiy
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2019
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6648495/
https://www.ncbi.nlm.nih.gov/pubmed/31459713
http://dx.doi.org/10.1021/acsomega.8b03039
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author Elashnikov, Roman
Háša, Jaromír
Děkanovský, Lukáš
Otta, Jaroslav
Fitl, Přemysl
Švorčík, Václav
Lyutakov, Oleksiy
author_facet Elashnikov, Roman
Háša, Jaromír
Děkanovský, Lukáš
Otta, Jaroslav
Fitl, Přemysl
Švorčík, Václav
Lyutakov, Oleksiy
author_sort Elashnikov, Roman
collection PubMed
description [Image: see text] Here, we propose a plasmon-induced redistribution of a thin polymer layer as a unique way for a residual layer-free lithographic approach. In particular, we demonstrate an ultrafast area-selective fabrication method using a low-intensity visible laser irradiation to direct the polymer mass flow, under the plasmon-active substrates. Plasmon-supported substrates were created by thermal annealing of Ag thin films and covered by thin polystyrene layers. Then, laser beam writing (LBW) was applied to introduce a surface tension gradient through the local plasmon heating. As a result, polystyrene was completely removed from the irradiated place, without any residual layer. The proposed approach does not require any additional development steps, such as solvent or plasma treatment. To demonstrate the advantages of the proposed technique, we implemented the LBW-patterned structures for further spatially selective surface functionalization, including the metal deposition, spontaneous thiol grafting, and electrochemical deposition of ordered polypyrrole array.
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spelling pubmed-66484952019-08-27 Application of Plasmon-Induced Lithography for Creation of a Residual-Free Pattern and Simple Surface Modifications Elashnikov, Roman Háša, Jaromír Děkanovský, Lukáš Otta, Jaroslav Fitl, Přemysl Švorčík, Václav Lyutakov, Oleksiy ACS Omega [Image: see text] Here, we propose a plasmon-induced redistribution of a thin polymer layer as a unique way for a residual layer-free lithographic approach. In particular, we demonstrate an ultrafast area-selective fabrication method using a low-intensity visible laser irradiation to direct the polymer mass flow, under the plasmon-active substrates. Plasmon-supported substrates were created by thermal annealing of Ag thin films and covered by thin polystyrene layers. Then, laser beam writing (LBW) was applied to introduce a surface tension gradient through the local plasmon heating. As a result, polystyrene was completely removed from the irradiated place, without any residual layer. The proposed approach does not require any additional development steps, such as solvent or plasma treatment. To demonstrate the advantages of the proposed technique, we implemented the LBW-patterned structures for further spatially selective surface functionalization, including the metal deposition, spontaneous thiol grafting, and electrochemical deposition of ordered polypyrrole array. American Chemical Society 2019-03-19 /pmc/articles/PMC6648495/ /pubmed/31459713 http://dx.doi.org/10.1021/acsomega.8b03039 Text en Copyright © 2019 American Chemical Society This is an open access article published under an ACS AuthorChoice License (http://pubs.acs.org/page/policy/authorchoice_termsofuse.html) , which permits copying and redistribution of the article or any adaptations for non-commercial purposes.
spellingShingle Elashnikov, Roman
Háša, Jaromír
Děkanovský, Lukáš
Otta, Jaroslav
Fitl, Přemysl
Švorčík, Václav
Lyutakov, Oleksiy
Application of Plasmon-Induced Lithography for Creation of a Residual-Free Pattern and Simple Surface Modifications
title Application of Plasmon-Induced Lithography for Creation of a Residual-Free Pattern and Simple Surface Modifications
title_full Application of Plasmon-Induced Lithography for Creation of a Residual-Free Pattern and Simple Surface Modifications
title_fullStr Application of Plasmon-Induced Lithography for Creation of a Residual-Free Pattern and Simple Surface Modifications
title_full_unstemmed Application of Plasmon-Induced Lithography for Creation of a Residual-Free Pattern and Simple Surface Modifications
title_short Application of Plasmon-Induced Lithography for Creation of a Residual-Free Pattern and Simple Surface Modifications
title_sort application of plasmon-induced lithography for creation of a residual-free pattern and simple surface modifications
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6648495/
https://www.ncbi.nlm.nih.gov/pubmed/31459713
http://dx.doi.org/10.1021/acsomega.8b03039
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