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Application of Plasmon-Induced Lithography for Creation of a Residual-Free Pattern and Simple Surface Modifications
[Image: see text] Here, we propose a plasmon-induced redistribution of a thin polymer layer as a unique way for a residual layer-free lithographic approach. In particular, we demonstrate an ultrafast area-selective fabrication method using a low-intensity visible laser irradiation to direct the poly...
| Autores principales: | , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
American Chemical Society
2019
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6648495/ https://www.ncbi.nlm.nih.gov/pubmed/31459713 http://dx.doi.org/10.1021/acsomega.8b03039 |