Atomic Layer Deposition of Photoconductive Cu(2)O Thin Films

[Image: see text] Herein, we report an atomic layer deposition (ALD) process for Cu(2)O thin films using copper(II) acetate [Cu(OAc)(2)] and water vapor as precursors. This precursor combination enables the deposition of phase-pure, polycrystalline, and impurity-free Cu(2)O thin films at temperature...

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Detalles Bibliográficos
Autores principales: Iivonen, Tomi, Heikkilä, Mikko J., Popov, Georgi, Nieminen, Heta-Elisa, Kaipio, Mikko, Kemell, Marianna, Mattinen, Miika, Meinander, Kristoffer, Mizohata, Kenichiro, Räisänen, Jyrki, Ritala, Mikko, Leskelä, Markku
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2019
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6648912/
https://www.ncbi.nlm.nih.gov/pubmed/31460221
http://dx.doi.org/10.1021/acsomega.9b01351

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6648912/
https://www.ncbi.nlm.nih.gov/pubmed/31460221
http://dx.doi.org/10.1021/acsomega.9b01351

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