The Effect of Substrate Biasing during DC Magnetron Sputtering on the Quality of VO(2) Thin Films and Their Insulator–Metal Transition Behavior

In this work, VO(2) thin films were deposited on Si wafers (onto (100) surface) by DC magnetron sputtering under different cathode bias voltages. The effects of substrate biasing on the structural and optical properties were investigated. The results show that the metal–insulator transition (MIT) te...

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Detalles Bibliográficos
Autores principales: Zhang, Chunzi, Gunes, Ozan, Li, Yuanshi, Cui, Xiaoyu, Mohammadtaheri, Masoud, Wen, Shi-Jie, Wong, Rick, Yang, Qiaoqin, Kasap, Safa
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6650896/
https://www.ncbi.nlm.nih.gov/pubmed/31284405
http://dx.doi.org/10.3390/ma12132160

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6650896/
https://www.ncbi.nlm.nih.gov/pubmed/31284405
http://dx.doi.org/10.3390/ma12132160

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