Rapid thermal annealing for high-quality ITO thin films deposited by radio-frequency magnetron sputtering

In this work, rapid thermal annealing (RTA) was applied to indium tin oxide (ITO) films in ambient atmosphere, resulting in significant improvements of the quality of the ITO films that are commonly used as conductive transparent electrodes for photovoltaic structures. Starting from a single sintere...

Descripción completa

Detalles Bibliográficos
Autores principales: Prepelita, Petronela, Stavarache, Ionel, Craciun, Doina, Garoi, Florin, Negrila, Catalin, Sbarcea, Beatrice Gabriela, Craciun, Valentin
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Beilstein-Institut 2019
Materias:
Full Research Paper
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6664415/
https://www.ncbi.nlm.nih.gov/pubmed/31431863
http://dx.doi.org/10.3762/bjnano.10.149

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6664415/
https://www.ncbi.nlm.nih.gov/pubmed/31431863
http://dx.doi.org/10.3762/bjnano.10.149

Ejemplares similares