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Rapid thermal annealing for high-quality ITO thin films deposited by radio-frequency magnetron sputtering
In this work, rapid thermal annealing (RTA) was applied to indium tin oxide (ITO) films in ambient atmosphere, resulting in significant improvements of the quality of the ITO films that are commonly used as conductive transparent electrodes for photovoltaic structures. Starting from a single sintere...
Autores principales: | Prepelita, Petronela, Stavarache, Ionel, Craciun, Doina, Garoi, Florin, Negrila, Catalin, Sbarcea, Beatrice Gabriela, Craciun, Valentin |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Beilstein-Institut
2019
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6664415/ https://www.ncbi.nlm.nih.gov/pubmed/31431863 http://dx.doi.org/10.3762/bjnano.10.149 |
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