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Effect of Electron Irradiation Fluence on InP-Based High Electron Mobility Transistors
In this paper, the effect of electron irradiation fluence on direct current (DC) and radio frequency (RF) of InP-based high electron mobility transistors (HEMTs) was investigated comprehensively. The devices were exposed to a 1 MeV electron beam with varied irradiation fluences from 1 × 10(14) cm(−2...
Autores principales: | , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2019
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6669653/ https://www.ncbi.nlm.nih.gov/pubmed/31266260 http://dx.doi.org/10.3390/nano9070967 |
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author | Sun, Shuxiang Ding, Peng Jin, Zhi Zhong, Yinghui Li, Yuxiao Wei, Zhichao |
author_facet | Sun, Shuxiang Ding, Peng Jin, Zhi Zhong, Yinghui Li, Yuxiao Wei, Zhichao |
author_sort | Sun, Shuxiang |
collection | PubMed |
description | In this paper, the effect of electron irradiation fluence on direct current (DC) and radio frequency (RF) of InP-based high electron mobility transistors (HEMTs) was investigated comprehensively. The devices were exposed to a 1 MeV electron beam with varied irradiation fluences from 1 × 10(14) cm(−2), 1 × 10(15) cm(−2), to 1 × 10(16) cm(−2). Both the channel current and transconductance dramatically decreased as the irradiation fluence rose up to 1 × 10(16) cm(−2), whereas the specific channel on-resistance (R(on)) exhibited an apparent increasing trend. These changes could be responsible for the reduction of mobility in the channel by the irradiation-induced trap charges. However, the kink effect became weaker with the increase of the electron fluence. Additionally, the current gain cut-off frequency (f(T)) and maximum oscillation frequency (f(max)) demonstrated a slightly downward trend as the irradiation fluence rose up to 1 × 10(16) cm(−2). The degradation of frequency properties was mainly due to the increase of gate-drain capacitance (C(GD)) and the ratio of gate-drain capacitance and gate-source capacitance (C(GD)/C(GS)). Moreover, the increase of R(on) may be another important factor for f(max) reduction. |
format | Online Article Text |
id | pubmed-6669653 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2019 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-66696532019-08-08 Effect of Electron Irradiation Fluence on InP-Based High Electron Mobility Transistors Sun, Shuxiang Ding, Peng Jin, Zhi Zhong, Yinghui Li, Yuxiao Wei, Zhichao Nanomaterials (Basel) Article In this paper, the effect of electron irradiation fluence on direct current (DC) and radio frequency (RF) of InP-based high electron mobility transistors (HEMTs) was investigated comprehensively. The devices were exposed to a 1 MeV electron beam with varied irradiation fluences from 1 × 10(14) cm(−2), 1 × 10(15) cm(−2), to 1 × 10(16) cm(−2). Both the channel current and transconductance dramatically decreased as the irradiation fluence rose up to 1 × 10(16) cm(−2), whereas the specific channel on-resistance (R(on)) exhibited an apparent increasing trend. These changes could be responsible for the reduction of mobility in the channel by the irradiation-induced trap charges. However, the kink effect became weaker with the increase of the electron fluence. Additionally, the current gain cut-off frequency (f(T)) and maximum oscillation frequency (f(max)) demonstrated a slightly downward trend as the irradiation fluence rose up to 1 × 10(16) cm(−2). The degradation of frequency properties was mainly due to the increase of gate-drain capacitance (C(GD)) and the ratio of gate-drain capacitance and gate-source capacitance (C(GD)/C(GS)). Moreover, the increase of R(on) may be another important factor for f(max) reduction. MDPI 2019-07-01 /pmc/articles/PMC6669653/ /pubmed/31266260 http://dx.doi.org/10.3390/nano9070967 Text en © 2019 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Sun, Shuxiang Ding, Peng Jin, Zhi Zhong, Yinghui Li, Yuxiao Wei, Zhichao Effect of Electron Irradiation Fluence on InP-Based High Electron Mobility Transistors |
title | Effect of Electron Irradiation Fluence on InP-Based High Electron Mobility Transistors |
title_full | Effect of Electron Irradiation Fluence on InP-Based High Electron Mobility Transistors |
title_fullStr | Effect of Electron Irradiation Fluence on InP-Based High Electron Mobility Transistors |
title_full_unstemmed | Effect of Electron Irradiation Fluence on InP-Based High Electron Mobility Transistors |
title_short | Effect of Electron Irradiation Fluence on InP-Based High Electron Mobility Transistors |
title_sort | effect of electron irradiation fluence on inp-based high electron mobility transistors |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6669653/ https://www.ncbi.nlm.nih.gov/pubmed/31266260 http://dx.doi.org/10.3390/nano9070967 |
work_keys_str_mv | AT sunshuxiang effectofelectronirradiationfluenceoninpbasedhighelectronmobilitytransistors AT dingpeng effectofelectronirradiationfluenceoninpbasedhighelectronmobilitytransistors AT jinzhi effectofelectronirradiationfluenceoninpbasedhighelectronmobilitytransistors AT zhongyinghui effectofelectronirradiationfluenceoninpbasedhighelectronmobilitytransistors AT liyuxiao effectofelectronirradiationfluenceoninpbasedhighelectronmobilitytransistors AT weizhichao effectofelectronirradiationfluenceoninpbasedhighelectronmobilitytransistors |