Fast Semiconductor–Metal Bidirectional Transition by Flame Chemical Vapor Deposition

[Image: see text] A simple yet powerful flame chemical vapor deposition technique is proposed that allows free control of the surface morphology, microstructure, and composition of existing materials with regard to various functionalities within a short process time (in seconds) at room temperature...

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Detalles Bibliográficos
Autores principales: Choi, Myung Sik, Na, Han Gil, Bang, Jae Hoon, Oum, Wansik, Choi, Sun-Woo, Kim, Sang Sub, Kim, Hyoun Woo, Jin, Changhyun
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2019
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6682083/
https://www.ncbi.nlm.nih.gov/pubmed/31460291
http://dx.doi.org/10.1021/acsomega.9b01112

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6682083/
https://www.ncbi.nlm.nih.gov/pubmed/31460291
http://dx.doi.org/10.1021/acsomega.9b01112

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