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Fast Semiconductor–Metal Bidirectional Transition by Flame Chemical Vapor Deposition
[Image: see text] A simple yet powerful flame chemical vapor deposition technique is proposed that allows free control of the surface morphology, microstructure, and composition of existing materials with regard to various functionalities within a short process time (in seconds) at room temperature...
Autores principales: | Choi, Myung Sik, Na, Han Gil, Bang, Jae Hoon, Oum, Wansik, Choi, Sun-Woo, Kim, Sang Sub, Kim, Hyoun Woo, Jin, Changhyun |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
American Chemical Society
2019
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Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6682083/ https://www.ncbi.nlm.nih.gov/pubmed/31460291 http://dx.doi.org/10.1021/acsomega.9b01112 |
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