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Investigation of energy band at atomic layer deposited AZO/β-Ga(2)O(3) ([Formula: see text] ) heterojunctions

The Al-doped effects on the band offsets of ZnO/β-Ga(2)O(3) interfaces are characterized by X-ray photoelectron spectroscopy and calculated by first-principle simulations. The conduction band offsets vary from 1.39 to 1.67 eV, the valence band offsets reduce from 0.06 to − 0.42 eV, exhibiting an alm...

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Detalles Bibliográficos
Autores principales: Sun, Shun-Ming, Liu, Wen-Jun, Golosov, Dmitriy Anatolyevich, Gu, Chen-Jie, Ding, Shi-Jin
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer US 2019
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6694324/
https://www.ncbi.nlm.nih.gov/pubmed/31414235
http://dx.doi.org/10.1186/s11671-019-3092-x
Descripción
Sumario:The Al-doped effects on the band offsets of ZnO/β-Ga(2)O(3) interfaces are characterized by X-ray photoelectron spectroscopy and calculated by first-principle simulations. The conduction band offsets vary from 1.39 to 1.67 eV, the valence band offsets reduce from 0.06 to − 0.42 eV, exhibiting an almost linear dependence with respect to the Al doping ratio varying from 0 to 10%. Consequently, a type-I band alignment forms at the interface of ZnO/β-Ga(2)O(3) heterojunction and the AZO/β-Ga(2)O(3) interface has a type-II band alignment. This is because incorporating Al into the ZnO would open up the band gaps due to the strong Al and O electron mixing, and the conduction and valence band edges consequently shift toward the lower level.