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Double Pinned Perpendicular-Magnetic-Tunnel-Junction Spin-Valve Providing Multi-level Resistance States

A new design for high density integration greater than gigabits of perpendicular-magnetic-tunnel-junction (p-MTJ) spin-valve, called the double pinned (i.e., bottom and top pinned structures) p-MTJ spin-valve achieved a multi-level memory-cell operation exhibiting four-level resistances. Three key m...

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Detalles Bibliográficos
Autores principales: Choi, Jin-Young, Jun, Hansol, Ashiba, Kei, Baek, Jong-Ung, Shim, Tae-Hun, Park, Jea-Gun
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2019
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6695488/
https://www.ncbi.nlm.nih.gov/pubmed/31417114
http://dx.doi.org/10.1038/s41598-019-48311-0
Descripción
Sumario:A new design for high density integration greater than gigabits of perpendicular-magnetic-tunnel-junction (p-MTJ) spin-valve, called the double pinned (i.e., bottom and top pinned structures) p-MTJ spin-valve achieved a multi-level memory-cell operation exhibiting four-level resistances. Three key magnetic properties, the anisotropy exchange field (H(ex)) of the bottom pinned structure, the coercivity (H(c)) of the double free-layer, and the H(c) of the top pinned structure mainly determined four-level resistances producing tunneling-magnetoresistance (TMR) ratios of 152.6%, 33.6%, and 166.5%. The three key-design concepts are: i) the bottom pinned structure with a sufficiently large H(ex) to avoid a write-error, ii) the H(c) of the double free-layer (i.e., ~0.1 kOe) much less than the H(c) of the top pinned structure (i.e., ~1.0 kOe), and iii) the top pinned structure providing different electron spin directions.