Magnetron Sputtering of Polymeric Targets: From Thin Films to Heterogeneous Metal/Plasma Polymer Nanoparticles

Magnetron sputtering is a well-known technique that is commonly used for the deposition of thin compact films. However, as was shown in the 1990s, when sputtering is performed at pressures high enough to trigger volume nucleation/condensation of the supersaturated vapor generated by the magnetron, v...

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Detalles Bibliográficos
Autores principales: Kylián, Ondřej, Shelemin, Artem, Solař, Pavel, Pleskunov, Pavel, Nikitin, Daniil, Kuzminova, Anna, Štefaníková, Radka, Kúš, Peter, Cieslar, Miroslav, Hanuš, Jan, Choukourov, Andrei, Biederman, Hynek
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6696368/
https://www.ncbi.nlm.nih.gov/pubmed/31349580
http://dx.doi.org/10.3390/ma12152366

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6696368/
https://www.ncbi.nlm.nih.gov/pubmed/31349580
http://dx.doi.org/10.3390/ma12152366

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