A Review: Preparation, Performance, and Applications of Silicon Oxynitride Film

Silicon oxynitride (SiN(x)O(y)) is a highly promising functional material for its luminescence performance and tunable refractive index, which has wide applications in optical devices, non-volatile memory, barrier layer, and scratch-resistant coatings. This review presents recent developments, and d...

Descripción completa

Detalles Bibliográficos
Autores principales: Shi, Yue, He, Liang, Guang, Fangcao, Li, Luhai, Xin, Zhiqing, Liu, Ruping
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Review
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6723468/
https://www.ncbi.nlm.nih.gov/pubmed/31434246
http://dx.doi.org/10.3390/mi10080552
Descripción
Sumario:Silicon oxynitride (SiN(x)O(y)) is a highly promising functional material for its luminescence performance and tunable refractive index, which has wide applications in optical devices, non-volatile memory, barrier layer, and scratch-resistant coatings. This review presents recent developments, and discusses the preparation methods, performance, and applications of SiN(x)O(y) film. In particular, the preparation of SiN(x)O(y) film by chemical vapor deposition, physical vapor deposition, and oxynitridation is elaborated in details.

Ejemplares similares