A Review: Preparation, Performance, and Applications of Silicon Oxynitride Film

Silicon oxynitride (SiN(x)O(y)) is a highly promising functional material for its luminescence performance and tunable refractive index, which has wide applications in optical devices, non-volatile memory, barrier layer, and scratch-resistant coatings. This review presents recent developments, and d...

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Detalles Bibliográficos
Autores principales: Shi, Yue, He, Liang, Guang, Fangcao, Li, Luhai, Xin, Zhiqing, Liu, Ruping
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Review
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6723468/
https://www.ncbi.nlm.nih.gov/pubmed/31434246
http://dx.doi.org/10.3390/mi10080552
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author Shi, Yue
He, Liang
Guang, Fangcao
Li, Luhai
Xin, Zhiqing
Liu, Ruping
author_facet Shi, Yue
He, Liang
Guang, Fangcao
Li, Luhai
Xin, Zhiqing
Liu, Ruping
author_sort Shi, Yue
collection PubMed
description Silicon oxynitride (SiN(x)O(y)) is a highly promising functional material for its luminescence performance and tunable refractive index, which has wide applications in optical devices, non-volatile memory, barrier layer, and scratch-resistant coatings. This review presents recent developments, and discusses the preparation methods, performance, and applications of SiN(x)O(y) film. In particular, the preparation of SiN(x)O(y) film by chemical vapor deposition, physical vapor deposition, and oxynitridation is elaborated in details.
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spelling pubmed-67234682019-09-10 A Review: Preparation, Performance, and Applications of Silicon Oxynitride Film Shi, Yue He, Liang Guang, Fangcao Li, Luhai Xin, Zhiqing Liu, Ruping Micromachines (Basel) Review Silicon oxynitride (SiN(x)O(y)) is a highly promising functional material for its luminescence performance and tunable refractive index, which has wide applications in optical devices, non-volatile memory, barrier layer, and scratch-resistant coatings. This review presents recent developments, and discusses the preparation methods, performance, and applications of SiN(x)O(y) film. In particular, the preparation of SiN(x)O(y) film by chemical vapor deposition, physical vapor deposition, and oxynitridation is elaborated in details. MDPI 2019-08-20 /pmc/articles/PMC6723468/ /pubmed/31434246 http://dx.doi.org/10.3390/mi10080552 Text en © 2019 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
spellingShingle Review
Shi, Yue
He, Liang
Guang, Fangcao
Li, Luhai
Xin, Zhiqing
Liu, Ruping
A Review: Preparation, Performance, and Applications of Silicon Oxynitride Film
title A Review: Preparation, Performance, and Applications of Silicon Oxynitride Film
title_full A Review: Preparation, Performance, and Applications of Silicon Oxynitride Film
title_fullStr A Review: Preparation, Performance, and Applications of Silicon Oxynitride Film
title_full_unstemmed A Review: Preparation, Performance, and Applications of Silicon Oxynitride Film
title_short A Review: Preparation, Performance, and Applications of Silicon Oxynitride Film
title_sort review: preparation, performance, and applications of silicon oxynitride film
topic Review
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6723468/
https://www.ncbi.nlm.nih.gov/pubmed/31434246
http://dx.doi.org/10.3390/mi10080552
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